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Infineon Technologies AG | 論文
- A Novel Embedded Extension SiGe (e^2SiGe) Process for PFET Performance Enhancement for 45nm Technology and beyond
- High Performance and Low Leakage CMOS for 45nm Low Power Technology and Beyond
- In situ SEM imaging at temperatures as high as 1450℃
- Influence of Silicon on Insulator Wafer Stress Properties on Placement Accuracy of Stencil Masks
- Properties of In-Plane-Gate Transistors for AMLCD (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
- Properties of in-plane-gate transistors for AMLCD
- Reducing of R_ in Vertical Power-MOSFETs due to Local Channel Doping
- 10 GHz Low-Noise Low-Power Monolithic Integrated VCOs in Digital CMOS Technology(Electronic Circuits)
- Automotive Sensors & Sensor Interfaces