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Hitachi Research Laboratory, Hitachi Lid. | 論文
- Electrical Conduction of Silicon Nitride Films Deposited by SiH_4-NH_3 Reaction
- Electrical and Mechanical Properties of Silicon Nitride Films Deposited by the SiCl_4-NH_3 Reaction
- Cracks in Silicon Dioxide-Phosphosilicate Glass-Silicon Nitride Composite Layer on Silicon Substrates
- X-Ray Fluorescence Analysis of Hg in SiO_2 Films Deposited by Hg-Sensitized Photo-CVD