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Faculty Of Engineering Takushoku University | 論文
- 平成21年度インターンシップ実施報告--一貫したキャリア教育を目指して
- Pb(Mg1/3Nb2/3)03-PbTiO3単結晶での巨大横効果圧電性の組成依存
- Comparison of Salicylamide and Acetaminophen and Their Prodrug Disposition in Dogs
- A METHOD FOR THE PREPARATION OF CALIBRATION CURVES FOR ACETAMINOPHEN GLUCURONIDE AND ACETAMINOPHEN SULFATE IN RABBIT URINE WITHOUT USE OF AUTHENTIC COMPOUNDS IN HIGH-PERFORMANCE LIQUID CHROMATOGRAPHY
- FIRST-PASS METABOLISM OF DRUG AND ITS PRODRUG IN DOGS
- Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography
- Inhomogeneous substitution of polyhalogenated copperphthalocyanine studied by high-resolution imaging and electron crystallography
- Fracture Behavior and Strength of Stepped-Lap Bonded Joint with Adhesive Resin under Tensile Loading
- Synthesis and Pharmacological Activity of O-(5-Isoxazolyl)-L-serine
- Structure and Synthesis of a New Monoterpenoidal Carboxamide from the Seeds of the Thai Medicinal Plant Acacia concinna
- Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
- Stabilization of ZrSi_xO_y Films by Irradiation with an ArF Excimer Laser
- Effect of Pretreatment with Antibiotics on the Hydrolysis of Salicyluric Acid in Rabbit Intestinal Microorganisms
- Effect of Oxygen on Compact CW-HCN Laser
- Single Channel Speech Enhancement Based on Perceptual Frequency-Weighting(Speech and Hearing)
- Effect of Pyrrolidone Derivatives on Lipid Membrane and Protein Conformation as Transdermal Penetration Enhancer
- Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
- Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
- Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
- Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films