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Electronics And Telecommunications Res. Inst. Taejeon Kor | 論文
- Remote Plasma-Assisted Metal Organic Chemical Vapor Deposition of Tantalum Nitride Thin Films with Different Radicals
- Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method
- Electrical and Microstructural Degradation with Decreasing Thickness of (Ba, Sr)TiO_3 Thin Films Deposited by RF Magnetron Sputtering
- Vertical-Cavity Surface-Emitting Lasers for Optical Data Storage
- Noise Performance of Pseudomorphic AlGaAs/InGaAs/GaAs High Electron Mobility Transistors with Wide Head T-Shaped Gate Recessed by Electron Cyclotron Resonance Plasma Etching
- Extremely Low Noise 0.15μm T-Gate AlGaAs/InGaAs Pseudomorphic HEMTs
- Low Noise Characteristics of 0.2μm Al_Ga_As/In_Ga_As/GaAs Pseudomorphic HEMTs with Wide Head T-Shaped Multifinger Gate
- Fabrication and Microwave Responses of YBa_2Cu_3O_ Superconducting Thin-Film Nanobridges
- Enhanced Current-Voltage Characteristics of Al_Ga_As/In_Ga_As/GaAs P-HEMTs Using an Inverted Double Channel Structure