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Dept. of Electronics Engineering, Chungnam National University | 論文
- Characterization of Hot Carrier Mechanism of Nano-Scale CMOSFETs(Session B6 Si-Devices II)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Theoretical Investigation of Neutral Point Defects in CoSi_2
- Dopant Dependency of Nickel Silicide and Its Improvement Utilizing Ni-Pd (5%) on SOI Substrate for Nano-scale CMOSFET
- Effects of O_2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs
- Dependence of Analog and Digital Performances on Mechanical Film Stress of ILD Layer in Nano-Scale CMOSFETs
- Dependence of Analog and Digital Performances on Mechanical Film Stress of ILD Layers in Nanoscale CMOSFETs