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Department Of Electrical Engineering And Computer Science Nagoya University | 論文
- Photoinduced Damage in Gd_Y_xCa_4O(BO_3)_3 Crystals
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
- Arc parameters around current zero in CO2-blast quenching chamber and their dependences on filled pressure (特集 アークプラズマ・電気接点とその応用)
- Initial Stage of Bias-Enhanced Diamond Nucleation Induced by Microwave Plasma
- Structural Study of Chemical-Vapor-Deposited Diamond Surface by High-Resolution Electron Microscopy
- Preliminary study of a new type of energy transmission system of artificial hearts
- Principle of the rotary undulation pump
- The prospect of a small-sized vibrating flow pump for an artificial heart
- A new hypothesis on the mechanism of calcification formed on a blood-contacted polymer surface
- Implantable total artificial heart: history and present status at the University of Tokyo
- COMPARATIVE DISTRIBUTION KINETICS OF CEFAZOLIN AND TOBRAMYCIN IN CHILDREN
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
- Formation of C_2 Radicals in High-Density C_4F_8 Plasmas Studied by Laser-Induced Fluorescence
- Enhancement of Surface Productions of CF_x Radicals by the Addition of H_2 into CF_4 Plasmas
- Loss Processes of F Atoms in Low-Pressure, High-Density CF_4 Plasmas with the Admixture of H_2
- Surface Kinetics of CF_x Radicals and Fluorine Atoms in the Afterglow of High-Density C_4F_8 Plasmas
- Lifetime Measurements of CF_x Radicals and H Atoms in Afterglow of CF_4/H_2 Plasmas