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Department Of Electrical And Electronics Engineering Nippon Institute Of Technology | 論文
- ULTRASONIC COURTSHIP SIGNAL IN A MOTH, OSTRINIA FURNACALIS I. FEMALE HEARING AND MATING BEHAVIOR(Behavior Biology and Ecology,Abstracts of papers presented at the 76^ Annual Meeting of the Zoological Society of Japan)
- Static Charge Elimination of Charged Matter by Vacuum UV Irradiation
- Fowler-Nordheim Current Oscillations in Si(111)/SiO_2/Twisted-Si(111) Tunneling Structures
- Formation of Nanometer-Scale Dislocation Network Sandwiched by Silicon-on-Insulator Layers
- Charge polarization effect on single-hole-characteristics in a two-dimensional Si multidot structure
- Ambipolar Coulomb Blockade Characteristics in a Two-Dimensional Si Multidot Device
- Resonant tunneling characteristics in SiO₂/Si double-barrier structures in a wide range of applied voltage
- Single-photon-induced random telegraph signal in a two-dimensional multiple-tunnel-junction array
- Thermally-induced formation of Si wire array on an ultrathin (111) silicon-on-insulator substrate
- Enhanced-Nitridation of Silicon by UV-Irradiation
- Oxidation-Retarded Diffusion of Bismuth in Silicon
- Estimation of Cytoplasmic Free Mg^+ Levels and Phosphorylation Potentials in Mung Bean Root Tips by In Vivo ^P NMR Spectroscopy
- Convergence Analysis of Quantizing Method with Correlated Gaussian Data (Special Section on Digital Signal Processing)
- Etching of Nondiamond Carbon in Diamond Thin Films Synthesized by Hot-Filament Chemical Vapor Deposition with Ultraviolet Irradiation
- Effect of Oxidation due to Ultraviolet-Light Irradiation on Diamond Thin Films Synthesized by Hot-Filament Chemical Vapor Deposition
- The Effect of Ultraviolet Irradiation on Electroless Plating Process of Nickel
- The Effect of Ultraviolet Irradiation on Eleclro and Electroless Platings of Nickel
- Creation of Highly Oriented Freestanding Carbon Nanotube Film by Sublimating Decomposition of Silicon Carbide Film
- Epitaxial Growth of 3C-SiC on Thin Silicon-on-Insulator Substrate by Chemical Vapor Deposition Using Alternating Gas Supply
- Tantalum Oxide Films Formed by UV Photo-CVD Using Ozone and TaCl_5