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Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym | 論文
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- Photobleaching Photoacid Generator
- Novel Molecular Resist Based on Derivative of Cholic Acid
- Postexposure Delay Effect in Chemically Amplified Resists
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Adhesion-promoted Copolymers for l93-nm Photoresists without Cross-linking during Lithographic Process
- Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists