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Central Research Laboratory, Hitachi Limited | 論文
- X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist
- Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
- Nanofabrication with a Novel EB System with a Large and Stable Beam Current
- Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
- Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems
- Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
- Investigation of Resist Pattern Deformation in Chemical Amplification Resists on SiN_x Substrates
- GaAs Radiation Damage Induced by Electron Cyclotron Resonance Plasma Etching with SF_6/CHF_3
- Development of Ammonia Adsorption Filter and Its Application to LSI Manufacturing Environment