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Central Research Laboratories Matsushita Electric Industrial Co. Ltd. | 論文
- Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
- 今さら聞けない? 基礎中の基礎
- Low-Temperature Synthesis of Aligned Carbon Nanofibers on Glass Substrates by Inductively Coupled Plasma Chemical Vapor Deposition
- Dielectric Properties of Pb(Mg_Nb_) (Fe_W_) O_3Ceramics : F: Ferroelectric Materials
- Dielectric Properties of Pb(Mg_Nb_) Ti(Ni_W_)O_3 Ceramic : F: Ferroelectric Materials
- Fabrication of Multilayer Structures and Ramp-Edge Josephson Junctions with (Hg,Re)Ba_2CaCu_2O_y Films
- (Hg, Re)Ba_2CaCu_2O_y [100]-Tilt Grain Boundary Josephson Junctions with High Characteristic Voltages
- Noise Properties of (Hg_Re_)Ba_2CaCu_2O_y Dc Superconducting Quantum Interference Device on (LaAlO_3)_-(SrAl_Ta_O_3)_ Substrates : Superconductors
- Chemical and Structural Characterization of Cu(In, Ga)Se_2/Mo Interface in Cu(In, Ga)Se_2 Solar Cells
- Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
- Surface Characterization of Chemically Treated Cu(In, Ga)Se_2 Thin Films
- 基礎講座
- 基礎講座
- 基礎講座
- 基礎講座
- Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias
- Intense Green Cathodoluminescence from Low-Temperature-Deposited ZnO Film with Fluted Hexagonal Cone Nanostructures
- SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
- Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering
- Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering