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Central Research Laboratories, Matsushita Electric Industrial Co., Ltd., | 論文
- Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- PREPARATION OF LANTHANUM-AND MAGNESIUM-MODIFIED LEAD TITANATE CERAMICS AND THIN FILMS, AND THEIR PYROELECTRIC PROPERTIES
- Interdiffusion Phenomena Caused by Postannealing of ZnS:Mn Films in Thin-Film Electroluminescent Device : Optical Properties of Condensed Matter
- Influence of Oxygen and Metal Oxide Impurities in ZnS:Mn Film on Characteristics of Electroluminescent Devices : Optical Properties of Condensed Matter
- An XPS Study of Blackening of Indium-Tin Oxide Film during Deposition of Dielectric Films by RF Magnetron Sputtering : Surfaces, Interfaces and Films
- Electric Resistance Change Mechanism of Indium-Tin Oxide Film During Deposition of Dielectric Oxide Films by RF Magnetron Sputtering : Techniques, Instrumentations and Measurement
- A Study of the Crystallographic and Luminescent Characteristics of ZnS:Mn Films Prepared by an RF Magnetron Sputtering Method for AC Thin-Film Electroluminescent Devices : Optical Properties of Condensed Matter
- Low-Temperature Preparation and Properties of Spinel-Type Iron Oxide Films by ECR Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Adsorption and Dissociation Mechanism of Excited N_2 on ZnSe Surface
- (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Ab Initio Calculations of Entropy and Heat Capacity of 1,1,1,2-Tetrafluoroethan(HFC-134a)
- Theoretical Study of Momentum Matrix Elements of GaN
- Patterning Characteristics of ITO Thin Films