Low-Temperature Preparation and Properties of Spinel-Type Iron Oxide Films by ECR Plasma-Enhanced Metalorganic Chemical Vapor Deposition

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概要

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• Spinel-type iron oxide films (Fe_3O_4) have been prepared on soda-lime glass substrates by ECR plasma-enhanced Metalorganic Chemical Vapor Deposition (MOCVD) using Iron (III) acetylacetonato complex [Fe(C_5H_7O_2)_3] or ferrocene [Fe(C_5H_5)_2] as the source material. The X-ray diffraction pattern, Auger spectrum and conversion electron Mossbauer spectrum indicated that high-crystallinity and carbon-free Fe_3O_4 film was obtained at a low temperature of 150℃ using ferrocene as the soruce material. SEM images showed that the film had a smooth surface and a columnar structure. Magnetization curves measured by VSM indicated that the film had no definite magnetic anisotropy.

• 社団法人応用物理学会の論文
• 1993-10-15

著者

• TORII Hideo

  Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.,

• FUJII Eiji

  Materials and Components Research Laboratory, Matsushita Electric Industrial Co., Ltd.

• Fujii Eiji

  Materials And Components Research Laboratory Matsushita Electric Industrial Co. Ltd.

• Torii Hideo

  Central Research Laboratories Matsushita Electric Industrial Co. Ltd.

関連論文

• Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• Low-Temperature Preparation and Properties of Spinel-Type Iron Oxide Films by ECR Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
• Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

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