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Central Research Lab. Hitachi Ltd. | 論文
- Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
- The Photopolymer Science and Technology Award
- Effect of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below
- Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems
- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
- Studies on Particle Separation by Acoustic Radiation Force and Electrostatie Force
- Study of Magnetic Stray Field Measurement on Surface Using New Force Microscope
- Simultaneous Observation of 3-Dimensional Magnetic Stray Field and Surface Structure Using New Force Microscope
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Novel Process for Direct Delineation of Spin on Glass (SOG)
- Chemical State Analysis of Silicon-Oxygen Compounds : CHEMICAL APPLICATIONS
- Micromagnetic Simulation of Recording Media and Magnetoresistive Heads
- 0.15μm Gate i-AlGaAs/n-GaAs HIGFET with a 13.3 S/Vcm K-Value (Special Issue on Heterostructure Electron Devices)
- A Method of Measuring Lifetime for Minority Carriers Induced by an Electron Beam in Germanium
- Thermal Characteristics of Si Mask for EB Cell Projection Lithography
- Role of Ion Bombardment in Field Emission Current Instability
- Acoustic Properties of Lens Materials for Ultrasonic Probes
- Sm-Substiuted Lead Titanate Ceramics for High Frequency Ultrasonic Probes : V: PIZOELECTRIC VIBRATOR
- Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
- Formation of Fractionated Novolak Resin Langmuir-Blodgett Films