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Center for Microelectronic Systems, Kyushu Institute of Technology | 論文
- Reduction of Charge Build-Up during Reactive Ion Etching by Using Silicon-On-Insulator Structures
- Field Emission from an Ion-Beam-Modified Polyimide Film
- A New Self-Aligned Process for Fabrication of Microemiter Arrays Using Selective Etching of Silicon
- A Realization of Multiple-Output Functions by a Look-Up Table Ring(Logic Synthesis)(VLSI Design and CAD Algorithms)
- Reduction of the Floating-Body Effect in SOI MOSFETs by Using Schottky Source/Drain Contacts
- Characteristics of Thin-Film Transistors Fabricated on Nucleation-Controlled Poly-Si Films by Surface Steps
- An Electrically Adjustable 3-Terminal Regulator for Post-Fabrication Level-Trimming with a Reliable 1-Wire Serial I/O
- CMOS Application of Single-Grain Thin Film Transistor Produced Using Metal Imprint Technology
- Breakdown Voltage in Uniaxially Strained n-Channel SOI MOSFET
- CMOS Application of Schottky Source/Drain SOI MOSFET with Shallow Doped Extension
- Schottky Source/Drain SOI MOSFET with Shallow Doped Extension