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Association Of Super-advanced Electronics Technologies:(present) Semiconductor Leading Edge Technolo | 論文
- Fabrication of 0.1 μm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography
- Fabrication of 0.13-μm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques
- BER Performance of Optically Controlled MESFETs as Photodetectors (Special Issue on Optomicrowave Techniques and Their Applications)
- Enhancement of Defocus Characteristics with Intermediate Phase Interference in Phase Shift Method (Special Issue on Quarter Micron Si Device and Process Technologies)
- Diagonal Phase Errors Affecting Optical Intensity in Phase Defect Repair Elements
- Phase Defect Repair Method for Alternating Phase Shift Masks Conjugate Twin-Shifter Method