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Advanced Technology Materials, Inc. | 論文
- Large Free-Standing GaN Substrates by Hydride Vapor Phase Epitaxy and Laser-Induced Liftoff
- Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition
- Characterization of 3C-SiC Epitaxial Layers on TiC(111) by Raman Scattering
- Reduced Pressure MOCVD of C-Axis Oriented BiSrCaCuO Thin Films