FURUTA Kenichiro | Corporate Research and Development Center, Toshiba Corporation
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概要
Corporate Research and Development Center, Toshiba Corporation | 論文
- Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions
- High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
- Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
- Active Magnetic Regeneration Behavior of Spherical Hydrogenated La(Fe_Si_)_ Fabricated by Rotating Electrode Process
- Long-Time Annealing and Activation Energy of the Interdiffusion at AlO_x/Co-Fe/Ir-Mn Interfaces