Fujimoto Hiroshi | Department of Applied Electronics, Daido Institute of Technology
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概要
Department of Applied Electronics, Daido Institute of Technology | 論文
- Electron Beam Doping by Superdiffusion in Unirradiated Regions (X
- Different Growth Modes of Al on Si(111)7×7 and Si(111)√×√ -Al Surfaces
- Behaviors of Auger Intensities Emitted from a Si(111)〔ルート3〕×〔ルート3〕-Al Surface During Incident Beam Rocking of Reflection High-Energy Electron Diffraction
- Observation of Vicinal Si(111)7×7 Surface by Energy-Filtered Reflection High-Energy Electron Diffraction
- Development of Energy-Filtered Reflection High-Energy Electron Diffraction Apparatus