TAKAGI Shin-ichi | Advanced LSI Technology Laboratory, Research and Development center, Toshiba corporation
スポンサーリンク
概要
- TAKAGI Shin-ichiの詳細を見る
- 同名の論文著者
- Advanced LSI Technology Laboratory, Research and Development center, Toshiba corporationの論文著者
Advanced LSI Technology Laboratory, Research and Development center, Toshiba corporation | 論文
- Influence of High Dielectric Constant in Gate Insulator on Remote Coulomb Scattering due to Gate Impurities in Si MOS Inversion Layer
- Physical Origins of Surface Carrier Density Dependences of Interface- and Remote-Coulomb Scattering Mobility in Si MOS Inversion Layer
- Unified Roughness Scattering Model Incorporating Scattering Component Induced by Thickness Fluctuation in SOI MOSFETs
- Quantitative Understanding of Mobility Degradation in High Effective Electric Field Region in MOSFETs with Ultra-thin Gate Oxides
- Quantitative Examination of Mobility Lowering Associated with Ultrathin Gate Oxides in Silicon Metal-Oxide-Semiconductor Inversion Layer