NIIYAMA Hiromi | ULSI Research Laboratories, Toshiba Corporation

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概要

• 同名の論文著者
• ULSI Research Laboratories, Toshiba Corporationの論文著者

ULSI Research Laboratories, Toshiba Corporation | 論文

• Two Correlated Mechanisms in Thin SiO_2 Breakdown
• Reliability of Structurally Modified Ultra-Thin Gate Oxides
• An Improved Bandgap Narrowing Model Based on Corrected Intrinsic Carrier Concentration
• Observation of Oxide-Thickness-Dependent Interface Roughness in Si MOS Structure
• Observation of Oxide Thickness Dependent Interface Roughness in Si MOS Structure

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