Nomoto Kazuki | University of Notre Dame, Notre Dame, IN 46556, U.S.A.
スポンサーリンク
概要
関連著者
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Mishima Tomoyoshi
Research & Development Laboratory, Corporate Advanced Technology Group, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Kaneda Naoki
Research & Development Laboratory, Corporate Advanced Technology Group, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Shiojima Kenji
Graduate School of Electrical and Electronics Engineering, University of Fukui, Fukui 910-8507, Japan
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Nomoto Kazuki
University of Notre Dame, Notre Dame, IN 46556, U.S.A.
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Takahashi Toshifumi
Graduate School of Electrical and Electronics Engineering University of Fukui, Fukui 910-8507, Japan
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Aoki Toshichika
Graduate School of Electrical and Electronics Engineering, University of Fukui, Fukui 910-8507, Japan
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Wakayama Hisashi
Graduate School of Electrical and Electronics Engineering, University of Fukui, Fukui 910-8507, Japan
著作論文
- Effect of Inductively Coupled Plasma Etching in p-Type GaN Schottky Contacts
- High-Temperature Isothermal Capacitance Transient Spectroscopy Study on Inductively Coupled Plasma Etching Damage for p-GaN Surfaces