FORTUNATO G. | Istituto di Elettronica dello Stato Solido, CNR
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概要
Istituto di Elettronica dello Stato Solido, CNR | 論文
- Numerical Analysis of the Electrical Characteristics of Gate Overlapped Lightly Doped Drain Polysilicon Thin Film Transistors
- A Two-Pass Excimer Laser Annealing Process to Control Amorphous Silicon Crystallization
- Pd-Gate a-Si:H Thin-Film Transistors as Hydrogen Sensors
- Source-Drain Metal Contact Effects in Short-Channel a-Si:H Thin-Film Transistors
- Theoretical Analysis of a-Si:H Based Multilayer Structure Thin Film Transistors