Unno Yasuyuki | Nanotechnology Research Center, Canon Inc.
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概要
Nanotechnology Research Center, Canon Inc. | 論文
- New Ellipsometric Approach to Critical Dimension Metrology Utilizing Form Birefringence Inherent in a Submicron Line-and-Space Pattern
- Application of Large-Scale Binary Optical Elements to High-Resolution Projection Optics Used for Microlithography
- Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
- Critical Dimension Control in Synchrotron Radiation Lithography Using a Negative-Tone Chemical Amplification Resist
- High-Precision Binary Optical Element Fabricated by Novel Self-Aligned Process