High-Precision Binary Optical Element Fabricated by Novel Self-Aligned Process
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-30
著者
-
Sekine Yoshiyuki
Nanotechnology Research Center Canon Inc.
-
MATSUMOTO Takahiro
Nanotechnology & Advanced System Research Laboratories, Canon Inc.
-
Hirose Ryusho
Nanotechnology Research Center Canon Inc.
-
TANAKA Ichiro
Nanotechnology Research Center, CANON Inc.
-
IWASAKI Yuichi
Nanotechnology Research Center, CANON Inc.
-
OGUSU Makoto
Nanotechnology Research Center, CANON Inc.
-
TAMAMORI Kenji
Nanotechnology Research Center, CANON Inc.
-
MAEHARA Hiroshi
Nanotechnology Research Center, CANON Inc.
-
Ogusu Makoto
Nanotechnology Research Center Canon Inc.
-
Tamamori Kenji
Nanotechnology Research Center Canon Inc.
-
Iwasaki Yuichi
Nanotechnology Research Center Canon Inc.
-
Maehara Hiroshi
Nanotechnology Research Center Canon Inc.
-
Matsumoto Takahiro
Nanotechnology Research Center Canon Inc.
-
Tanaka Ichiro
Nanotechnology Research Center Canon Inc.
-
Ogusu Makoto
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
-
Iwasaki Yuichi
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
関連論文
- Application of Large-Scale Binary Optical Elements to High-Resolution Projection Optics Used for Microlithography
- Alignment Offset Analyzer against Wafer-Induced Shift
- Alignment Mark Optimization to Reduce Tool- and Wafer-Induced Shift for XRA-1000
- Feasibility Study on Immersion System Using High-Index Materials
- High-Precision Binary Optical Element Fabricated by Novel Self-Aligned Process
- Alignment Offset Analyzer against Wafer-Induced Shift