Moonkeun Kim | Department of Control and Instrumentation Engineering, Korea University, Chungnam 339-700, Korea
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- Department of Control and Instrumentation Engineering, Korea University, Chungnam 339-700, Koreaの論文著者
Department of Control and Instrumentation Engineering, Korea University, Chungnam 339-700, Korea | 論文
- Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma
- Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
- Etching Characteristics and Mechanism of InP in Inductively Coupled HBr/Ar Plasma
- Etching Characteristics of In2O3 and SnO2 Thin Films in an Inductively Coupled HBr/Ar Plasma: Effects of Gas Mixing Ratio and Bias Power
- Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas