HAZAMA Hiroaki | Microelectronics Engineering Laboratory, Toshiba Corp.

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• HAZAMA Hiroakiの詳細を見る
• 同名の論文著者
• Microelectronics Engineering Laboratory, Toshiba Corp.の論文著者

Microelectronics Engineering Laboratory, Toshiba Corp. | 論文

• Single Crystalline Silicon Floating Gate Technology for Sub-10nm Interelectrode Dielectrics
• New PentaCoordinated Si(PCS) Model for SiN CVD Mechanism
• Precipitation of Boron in Highly Boron-Doped Silicon
• Oxide-Mediated Solid Phase Epitaxy(OMSPE)of Silicon : A New Low-Temperature Epitaxy Technique Using Intentionally Grown Native Oxide
• Diffusion and Segregation of Carbon in SiO_2 Films

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