Lee Chul | Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

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概要

• Lee Chulの詳細を見る
• 同名の論文著者
• Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Koreaの論文著者

関連著者

• Yang Wouns

  Advanced Technology Development Team

• YOSHIDA Makoto

  Advanced Technology Development Team

• MOON Joon-Seok

  Advanced Technology Development Team

• JUNG Kyoung-Ho

  Advanced Technology Development Team

• KIM Keunnam

  Advanced Technology Development Team

• SUNG Hyunju

  Advanced Technology Development Team

• Lee Chul

  Advanced Chemical Technology Division Krict

• Oh Kyung-Seok

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., Hwasung, Kyunggi 445-701, Korea

• Oh Kyung-Seok

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

• Kahng Jaerok

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

• Kim Keunnam

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

• Yang Wouns

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

• Lee Chul

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

• Jung Kyoung-Ho

  Advanced Technology Development Team 1, Memory R&D Center, Samsung Electronics Co., San #16 Banwol-dong, Hwasung, Gyeonggi-do 445-701, Korea

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著作論文

• A Novel Multifin Dynamic Random Access Memory Periphery Transistor Technology Using a Spacer Patterning through Gate Polycrystalline Silicon Technique

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