NISHI Yoshio | Semiconductor Engineering Dept., Tokyo Shibaura Electric Co., Ltd.
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概要
Semiconductor Engineering Dept., Tokyo Shibaura Electric Co., Ltd. | 論文
- Infrared Reflectivity of N on N^+ Si Wafers
- On the Distribution of Impurities in Epitaxial Silicon Films
- Determination of Epitaxial-Layer Impurity Distriburion by Neutron A ctivation Method
- Effect of Heat Treatment on the Infrared Reflectivities of Heavily-Doped N-Type Silicon
- Non-Destructive Determination of Impurity Concentration in Silicon Epitaxial Layer Using Metal-Silicon Schottky Barrier