CHEN Shih-Chang | VLSI R&D Center, OKI Electric Industry Co., Ltd.
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概要
VLSI R&D Center, OKI Electric Industry Co., Ltd. | 論文
- Cross-sectional Transmission Electron Microscope Studies on Intrinsic Breakdown Spots of Thin Gate Oxides
- Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
- Studies of Corrosive Outgasses from Via Holes Using Thermal Desorption Spectroscopy
- Thermal Desorption and Infrared Studies of Plasma-Enhanced Chemical Vapor Deposited SiO Films with Tetraethyiorthosilicate
- Ultra-High Selectivity Sidewall-Spacer Etching and Contact Hole Etching Technologies for 0.1μm FD-SOI Devices