ISHIDA Taiichiro | Dept. of Architecture and Environmental Design, Graduated School Engineering, Kyoto University
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概要
- ISHIDA Taiichiroの詳細を見る
- 同名の論文著者
- Dept. of Architecture and Environmental Design, Graduated School Engineering, Kyoto Universityの論文著者
論文 | ランダム
- C-6-3 化学量論的なTaN薄膜の(100)Si上での室温エピタキシャル成長(C-6.電子部品・材料,エレクトロニクス2)
- Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O_2 mixed gas
- Effects of thermal treatment on structure and electrical properties of sputtered Ir-W alloy thin films
- Orientation of metal films deposited by sputtering using Ar/N_2 gas mixtures
- Characterization of Ag oxide thin films prepared by reactive RF sputtering