HARA Shigehiro | ULSI Research Laboratories, Toshiba Corporation

スポンサーリンク

概要

• 同名の論文著者
• ULSI Research Laboratories, Toshiba Corporationの論文著者

ULSI Research Laboratories, Toshiba Corporation | 論文

• Two Correlated Mechanisms in Thin SiO_2 Breakdown
• Reliability of Structurally Modified Ultra-Thin Gate Oxides
• An Improved Bandgap Narrowing Model Based on Corrected Intrinsic Carrier Concentration
• Observation of Oxide-Thickness-Dependent Interface Roughness in Si MOS Structure
• Observation of Oxide Thickness Dependent Interface Roughness in Si MOS Structure

もっと見る

スポンサーリンク