KOBAYASHI Kiyoteru | Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation
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- Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporationの論文著者
Process Development Department, Process Technology Development Division, Production and Technology Unit, Renesas Technology Corporation | 論文
- A New Divided Deposition Method of TiN Thin Films for MIM Capacitor Applications
- Investigation of the Divided Deposition Method of TiN Thin Films for Metal–Insulator–Metal Capacitor Applications
- Low temperature divided CVD technique for TiN metal gate electrodes of p-MISFETs
- Diffusion Control Techniques for TiN Stacked Metal Gate Electrodes for p-Type Metal Insulator Semiconductor Field Effect Transistors
- Local Bonding Structure of High-Stress Silicon Nitride Film modified by UV Curing for Strained-Silicon Technology beyond 45nm Node SoC Devices