Park Jong-Wan | Department of Metallurgical Engineering, Hanyang University
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概要
Department of Metallurgical Engineering, Hanyang University | 論文
- Diffusion Barrier Property of Molybdenum Nitride Films for Copper Metallization
- The Effects of Pretreatment, CH_4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films
- The Effects of Pretreatment, CH4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films
- Preparation and Characterization of α-Amylase Immobilized inorganic/Organic Hybrid Membrane Using Chitosan as a Dispersant in the Sol-Gel Process
- Self-Assembled Process for the Preparation of Ultra-thin Zeolite Films