AKASAKA Youichi | LSI Development Laboratory, Mitsubishi Electric Corporation
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概要
LSI Development Laboratory, Mitsubishi Electric Corporation | 論文
- A Three-Dimensional Study of the Absorbed Energy Density in Electron-Resist Films on Substrates
- The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
- A New Multiplex Input Technique for High Density CCD Memory : A-6: CHARGE TRANSFER DEVICES/SIT AND OTHER DEVICES
- A high Speed I^2L 1K Static RAM with 20 ns Access Time : A-3: MOS DEVICE AND LIST (3)
- A New Transistor Structure for High Speed Bipolar LSI : A-4: LSI DEVICES