ISHIWATA Shunichi | Microelectronics Engineering Lab., Toshiba Corporation
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概要
Microelectronics Engineering Lab., Toshiba Corporation | 論文
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Inlaid Cu Interconnects Employing Ti-Si-N Barrier Metal for ULSI Applications
- Study of LOCOS-Induced Anomalous Leakage Current in Thin Film SOI MOSFET's