Shim Kwang | Department of Materials Science and Engineering, Hanyang University
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概要
Department of Materials Science and Engineering, Hanyang University | 論文
- Electrical Properties of Atomic Layer Deposited HfO_2 Gate Dielectric Film Using D_2O as Oxidant for Improved Reliability
- Electrical Properties of Atomic Layer Deposited HfO2 Gate Dielectric Film Using D2O as Oxidant for Improved Reliability
- Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
- Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling
- Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength