Kawamura Midori | Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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概要
- Kawamura Midoriの詳細を見る
- 同名の論文著者
- Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japanの論文著者
関連著者
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Kawamura Midori
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Itoh Hidenobu
Department Of Materials Science And Engineering Kitami Institute Of Technology
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Abe Yoshio
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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KATO Kiyohiko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
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Suzuki Tsutomu
Department Of Applied And Environmental Chemistry Kitami Institute Of Technology
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Abe Yoshio
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Ueta Hideaki
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Kato Kiyohiko
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Ueta Hideaki
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Peng Fei
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Takiguchi Yasuhiro
Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
著作論文
- Effects of Substrate Cooling during Sputter Deposition of Hydrogen-Containing Ta2O5 Thin Films in H2O Atmosphere on their Ion Conductivity
- Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using $\text{O$_{2}$} + \text{H$_{2}$O}$ Mixed Gas