LEE K | United Microelectronics Corp. (UMC), CRD Logic Division

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• 同名の論文著者
• United Microelectronics Corp. (UMC), CRD Logic Divisionの論文著者

United Microelectronics Corp. (UMC), CRD Logic Division | 論文

• NBTI Improvement under Highly Compressive Contact Etching Stop Layer (CESL) for 45nm Node CMOS and Beyond
• A High Gain (25%) Strained Silicon Scheme for 65nm High Performance nMOSFETs
• 56% pMOSFETs Drive Current Enhancement from Optimized Compressive Contact Etching Stop Layer (CESL) for 45nm Node CMOS
• Effect of STI Stress Enhanced Boron Diffusion on Leakage and Vcc min of Sub-65nm node Low-Power SRAM
• The Impact for Gate Oxide Scaling (32Å-12Å) and Power Supply for Sub-0.1μm CMOSFETs

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