YOSHIKAWA Kohta | Advanced Technology Division, Fujitsu Limited
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概要
Advanced Technology Division, Fujitsu Limited | 論文
- Anomalous Etching Residues of Sputter-Deposited Ta upon Reactive Ion Etching Using Chlorine-Based Plasmas
- Precise Reactive Ion Etching of Ta Absorber on X-Ray Masks
- Precise Reactive Ion Etching of Ta Absorber on X-Ray Masks : X-Ray Lithography
- Comparing Effects of Vacuum Annealing and Dry Oxidation on the Photoluminescence of Porous Si
- Selective Growth of Polyacetylene Narrow Wires Utilizing Capillary Action of Catalyst Solution in Grooves