Precise Reactive Ion Etching of Ta Absorber on X-Ray Masks : X-Ray Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• NAKAISHI Masafumi

  Advanced Technology Division, Fujitsu Limited

• Sugishima Kenji

  Advanced Technology Division Fujitsu Limited

• Nakaishi Masafumi

  Advanced Technology Division Fujitsu Limited

関連論文

• Anomalous Etching Residues of Sputter-Deposited Ta upon Reactive Ion Etching Using Chlorine-Based Plasmas
• Precise Reactive Ion Etching of Ta Absorber on X-Ray Masks
• Precise Reactive Ion Etching of Ta Absorber on X-Ray Masks : X-Ray Lithography

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