INUSHIMA Takashi | Department of Electronics, Tokai University
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概要
Department of Electronics, Tokai University | 論文
- Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- Temperature Dependence of Electrical Conduction Mechanism in Amorphous Semiconductor
- An Interpretation of Transient Switching Process in Amorphous Films of As_Te_Ge_Si_
- In-Plane Orientation and Annealing Behavior of Rutile TiO_2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering