EIMORI T. | Semiconductor Leading Edge Technologies, Inc.
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概要
Semiconductor Leading Edge Technologies, Inc. | 論文
- Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography
- Stabilization of ZrSi_xO_y Films by Irradiation with an ArF Excimer Laser
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Fabrication of 0.1 μm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography