FUJISAKI Yoshihisa | Central Research Laboratory, Hitachi Limited
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概要
Central Research Laboratory, Hitachi Limited | 論文
- X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist
- Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
- Investigation of Resist Pattern Deformation in Chemical Amplification Resists on SiN_x Substrates
- Development of Ammonia Adsorption Filter and Its Application to LSI Manufacturing Environment
- Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process