Tanabe Masafumi | ULVAC Japan, Ltd.
スポンサーリンク
概要
ULVAC Japan, Ltd. | 論文
- Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing
- Realistic Etch Yield of Fluorocarbon ions in SiO_2 Etch Process
- Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena
- Measurements of Molecular Densities in Low Pressure Discharge Plasmas Using Laser Raman Scattering
- Operation of a CSL Gauge in Extremely High Vacuum