SUNAKAWA Haruo | Fundamental Res. Labs., NEC Corporation
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概要
Fundamental Res. Labs., NEC Corporation | 論文
- Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
- Calixarene Electron Beam Resist for Nano-Lithography
- Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
- Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition