HIEDA Katsuhiko | Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation

スポンサーリンク

概要

• HIEDA Katsuhikoの詳細を見る
• 同名の論文著者
• Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporationの論文著者

Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation | 論文

• Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors
• Sub 1.3nm Amorphous Ta_2O_5 Gate Dielectrics for Damascene Metal Gate Transistor
• Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
• Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
• Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure

もっと見る

スポンサーリンク