Teranishi Toshiharu | CREST, Japan Science and Technology Agency (JST), Yokohama 226-8503, Japan
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概要
- Teranishi Toshiharuの詳細を見る
- 同名の論文著者
- CREST, Japan Science and Technology Agency (JST), Yokohama 226-8503, Japanの論文著者
関連著者
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Azuma Yasuo
Materials And Structures Laboratory Tokyo Institute Of Technology
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Majima Yutaka
Materials And Structures Laboratory Tokyo Institute Of Technology
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Teranishi Toshiharu
CREST, Japan Science and Technology Agency (JST), Yokohama 226-8503, Japan
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MATSUMOTO Kazuhiko
CREST, Japan Science and Technology Agency
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Kano Shinya
Materials And Structures Laboratory Tokyo Institute Of Technology
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Ohno Yasuhide
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
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Hackenberger Guillaume
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Tanaka Daisuke
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
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Sakamoto Masanori
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
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Maehashi Kenzo
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
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Kono Keijiro
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Azuma Yasuo
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Yasutake Yuhsuke
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Kanehara Masayuki
CREST, Japan Science and Technology Agency (JST), Yokohama 226-8503, Japan
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Matsumoto Kazuhiko
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
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Teranishi Toshiharu
CREST---Japan Science and Technology Agency (JST), Chiyoda, Tokyo 102-0076, Japan
著作論文
- Single-Electron Transistor Fabricated by Two Bottom-Up Processes of Electroless Au Plating and Chemisorption of Au Nanoparticle
- Silicon--Nitride-Passivated Bottom-Up Single-Electron Transistors
- Silicon--Nitride-Passivated Bottom-Up Single-Electron Transistors