Negishi Ryota | Department of Applied Physics, Osaka University, Suita, Osaka 560-0871, Japan
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概要
- Negishi Ryotaの詳細を見る
- 同名の論文著者
- Department of Applied Physics, Osaka University, Suita, Osaka 560-0871, Japanの論文著者
関連著者
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Negishi Ryota
Department of Applied Physics, Osaka University, Suita, Osaka 560-0871, Japan
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Ohno Yasuhide
The Institute Of Scientific And Industrial Research Osaka University
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Matsumoto Kazuhiko
The Institute Of Scientific And Industrial Research Osaka University
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Kobayashi Yoshihiro
Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan
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Maehashi Kenzo
The Institute Of Scientific And Industrial Research Osaka University
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Ishibashi Koji
Advanced Device Laboratory Riken:crest Japan Science And Technology(jst)
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Ogawa Takuji
Department Of Chemistry Faculty Of Science Ehime University
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Tanaka Hirofumi
Department Of Agricultural Chemistry Nagoya University
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Nishino Takayuki
Advanced Device Laboratory, RIKEN Advanced Science Institute, Wako, Saitama 351-0198, Japan
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Hirano Hiroki
Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan
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Haehashi Kenzo
The Institute of the Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Matsumoto Kazuhiko
The Institute of the Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Negishi Ryota
Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan
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Ohno Yasuhide
The Institute of the Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Maehashi Kenzo
The Institute of the Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
著作論文
- Fabrication of Nanogap Electrodes by the Molecular Lithography Technique
- Carrier Transport Properties of the Field Effect Transistors with Graphene Channel Prepared by Chemical Vapor Deposition
- Thickness Control of Graphene Overlayer via Layer-by-Layer Growth on Graphene Templates by Chemical Vapor Deposition