Okaura Shingo | Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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概要
- Okaura Shingoの詳細を見る
- 同名の論文著者
- Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japanの論文著者
関連著者
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Okaura Shingo
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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SAITO Keisuke
Application Laboratory
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Yamada Tomoaki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Ueno Risako
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Okamoto Shoji
Department Of Dermatology School Of Medicine Chiba University
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Suzuki Muneyasu
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Koda Seiichiro
Department Of Chemical Engineering Facutly Of Engineering The University Of Tokyo
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Uchida Hiroshi
Department Of Anesthesia Tottori Prefectural Central Hospital
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Saito Keisuke
Application Laboratory, Bruker AXS, 3-9-A-6 Moriya-cho, Kanazawa-ku, Yokohama 221-0022, Japan
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Nakajima Mitsumasa
NTT Microsystem Integration Laboratory, Nippon Telegraph and Telephone, Atsugi, Kanagawa 243-0198, Japan
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Uchida Hiroshi
Department of Chemistry, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan
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Suzuki Muneyasu
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Okaura Shingo
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Okaura Shingo
Department of Innovative Engineered Materials, Tokyo Institute of Technology, G1-32, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Funakubo Hiroshi
Department of Innovative Engineered Materials, Tokyo Institute of Technology, G1-32, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Yamada Tomoaki
Department of Materials, Physics and Energy Engineering, Nagoya University, Nagoya 464-8603, Japan
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Ueno Risako
Department of Innovative Engineered Materials, Tokyo Institute of Technology, G1-32, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
著作論文
- Crystal Structure and Electrical Properties of Epitaxial BiFeO3 Thin Films Grown by Metal Organic Chemical Vapor Deposition
- Effects of A-Site Occupancy of Bismuth Ions on the Dielectric Tunable Properties of Pyrochlore Bismuth Zinc Niobate Films
- MOCVD Growth of Bi1.5Zn1.0Nb1.5O7 (BZN) Epitaxial Thin Films and Their Electrical Properties