Chi Dong-Zhi | Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602
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概要
- Chi Dong-Zhiの詳細を見る
- 同名の論文著者
- Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602の論文著者
関連著者
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Chi Dong-Zhi
Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602
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Kwong Dim-Lee
Institute of Microelectronics
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Lo Guo-Qiang
Institute of Microelectronics
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SINGH Navab
Institute of Microelectronics
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Hoe Keat-mun
Institute Of Microelectronics (ime)
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Li Rui
Silicon Nano Device Lab Department Of Ece National University Of Singapore
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Cui Guang
School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
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Chin Yoke
School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
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Kwong Dim-Lee
Institute of Microelectronics, 11 Science Park Road, Singapore Science Park II, Singapore 117685
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Lee Sung-Joo
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576
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Hong Ming-Hui
Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Lo Guo-Qiang
Institute of Microelectronics, Science Park II, Singapore 117685
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Tan Eu
School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
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Pey Kin
School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
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Lee Pooi
School of Materials Science and Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
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Chi Dong-Zhi
Institute of Materials Research Engineering, 3 Research Link, Singapore 117602
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Li Rui
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576
著作論文
- Erbium silicided Schottky Source/Drain Silicon Nanowire N-Metal–Oxide–Semiconductor Field-Effect Transistors
- Pt–Germanide Formed by Laser Annealing and Its Application for Schottky Source/Drain Metal–Oxide–Semiconductor Field-Effect Transistor Integrated with TaN/Chemical Vapor Deposition HfO2/Ge Gate Stack